Second podium for Racing Engineering's Dani Clos this weekend
Racing Engineering had another strong day at Silverstone, where the fifth sprint race of the season took place this morning. Dani Clos scored yet another podium, the second of the weekend, by finishing third. After a magnificent start and a race always on the attack, Dani was able to score more precious points for his championship battle. Christian Vietoris, who suffered from wheelspin at the start, had a strong performance as well, spending most of the race in sixth position but, experiencing tyre wear issues, he finished the race in tenth position.
Although shortly before the race start some rain drops fell, today's GP2 sprint race at Silverstone took place under dry conditions. Christian Vietoris, starting from third position on the grid, struggled with his clutch and suffered from excessive wheelspin. Unable to maintain his position, the young German dropped back to sixth. Dani Clos, on the other hand, had a fantastic start from sixth on the grid which allowed him to finish the first lap already in fourth place.
Perez, ahead of Dani, quickly overtook Valsecchi and then Turvey to take the lead on lap 6. Dani, now stuck to the iSport car of Valsecchi, took a bit longer to pass the Italian since he kept at the back of his mind that it was more important to score points by not taking any unnecessary risks. Valsecchi kept resisting to Dani Clos, but when the Spaniard saw a gap in lap 10, he passed him for third position. Dani quickly closed in on Turvey, who ran in second, having a time gap of only two tenths of a second by lap 15. However, Dani was under permanent pressure from Maldonado, who ran just behind the Spaniard, with a gap of less than a second throughout the race. Between the attacks of Maldonado, the wish to bring home important points and a Turvey who just didn't make any mistakes, Dani settled for third, his second podium of the weekend.
Team mate Christian Vietoris was stuck to Maldonado in fifth during the opening stages of the race, keeping up with the cars in front of him. However, when Dani Clos and Maldonado passed Valsecchi and the italian ran just ahead of Christian, the Racing Engineering driver wasn't able to pass him and started to suffer from excessive tyre wear on his rear tyres. With 5 laps to go, Christian lost his sixth position, and chance to score a point, when Bianchi passed him. On the last lap, Christian lost the rear of his car, opening a gap for his followers, who took advantage and passed the German, who dropped back to tenth position.
Dani Clos holds onto his second place in the drivers' standings, behind GP2 veteran Maldonado, after scoring his second podium of the weekend in Silverstone. The second half of the 2010 GP2 season starts in two week's time at the Hockenheimring in Germany, where the goal for both Racing Engineering drivers is to secure more points.
Dani Clos: "I had a very good start today and am happy about this. I moved up to forth position during the first laps, when everyone on track was quite aggressive. When Perez passed Valsecchi, I took some more time to study the driver in front of me and when I saw the gap, I passed him. Then, Turvey didn't make a mistake. This was a good weekend and the car was great all weekend long. We have scored more points, but now we need to forget about Silverstone and prepare for Hockenheim."
Christian Vietoris: "The weekend went really well until today. But today was not optimal. The start was not OK as I struggled with the clutch. At the beginning, I could stay close to Maldonado and keep the pace, but then my rear tyres went away and I wasn't able to keep the pace anymore. On the last lap I lost several positions when I lost the rear of the car and four cars passed me."
Alfonso de Orlèans-Borbon, President of Racing Engineering: "Very good, another podium for Dani. Although, it's a pity, as I think he could have finished second today. The team did a fantastic job. Now we are going to get ready for Hockenheim."
-source: racing engineering